Over 20 methods for measuring inorganic contamination
The new edition of the Agilent ICP-QQQ Semiconductor Applications Compendium contains 20+ optimized methods to measure inorganic contamination in:
- Wafer materials
- Ultrapure water and hydrogen peroxide
- Process chemicals, acids, and solvents
- Precursor and process gases
The methods include instrument configuration and tuning parameters, sample and standard preparation details and representative results and can be used to measure the elemental content of:
- Incoming bulk process chemicals and reagents
- Plant UPW, point of use and in-line chemicals
- Cleaning baths (solvents, Piranha, RCA SC-1/2, BOE, HF, etc.)
- CMP slurries and high purity metals
- Air quality – metals, organometallics, and particles – for workplace monitoring