Over 20 methods for measuring dissolved and particulate contamination
The new edition of the Agilent ICP-QQQ Semiconductor Applications Compendium contains 20+ optimized methods to measure inorganic contamination in:
- Wafer materials
- Ultrapure water and hydrogen peroxide
- Process chemicals, acids, and solvents
- Precursor and process gases
The methods include instrument configuration and tuning parameters, sample and standard preparation details and representative results.